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- At ICMOVPE XXI, AIST in Collaboration with Taiyo Nippon Sanso will present on Accelerated Raw-Material Utilization-Efficiency of GaAs Using Vertical Flow Type, Single-Chamber Hydride Vapor Phase Epitaxy, May 12th-17th April 23, 2024
- At ICMOVPE XXI, Taiyo Nippon Sanso will present on Contribution to High-Quality Semiconductor Manufacturing with Face-Down MOCVD, May 12th-17th April 23, 2024
- At ICMOVPE XXI, Taiyo Nippon Sanso will present on Development of MOCVD Equipment for Nitride Semiconductors Compatible with Low Vapor Pressure Precursor Supply, May 12th-17th April 23, 2024
- At ICMOVPE XXI, North Carolina State University with TNSC MOCVD reactor technology will present on Epitaxial Growth and Characterization of AlInN/GaN Superlattices, May 12th-17th April 23, 2024