Taiyo Nippon Sanso Corporation (TNSC) was the first in the world to develop MOCVD equipment to produce compound semiconductors utilized in LEDs, lasers, and high performance electronics for applications such as mobile phones, advanced lighting, and optical communications systems.
TNSC equipment is highly regarded worldwide for its exceptionally stable performance. Contact us for more information.
FR Series Reactors for Research and Small Scale Production
Ga2O3 and related alloy processing for wafers up to 50 mm
HR Series Reactors for Research and Mass Production
GaAs, InP, and related alloy processing for wafer diameters up to 200 mm
BRC/BMC Series Reactors for Research and Mass Production
GaAs, InP, and related alloy processing for wafer diameters up to 150 mm
Arsine (AsH3), Phosphine (PH3), Silane (SiH4), and Ammonia (NH3) are the primary gases that are used in MOCVD applications.
Ultrapurification equipment for electronics can be integrated with MOCVD equipment.