Introducing the new UR26K-CCD: The world’s most advanced GaN MOCVD reactor for power, high frequency, and micro-LED devices. An industry leader for over 40 years, Taiyo Nippon Sanso Corporation (TNSC) brings to market unparalleled MOCVD productivity and performance.
Fully automated cassette-to-cassette (C2C) wafer loading increases throughput, reduces contamination from wafer handling, and increases overall product yield.
Integrated Dry Cleaning
Reactor parts are robotically transferred to an integrated chamber and cleaned in parallel with MOCVD processing, maximizing the productivity of the MOCVD chamber.
• Higher yield performance with fully automated cassette-to-cassette wafer transfer system
• Higher reproducibility and lower cost of ownership with integrated cleaning system for reactor components
• High epi-controllability with horizontal tri-laminar flow nozzle and stable gear driven susceptor rotation and wafer revolution
• Sequence programming and data logging functions optimized for mass production