- Achievement of High-Speed Growth of High-Purity β-Gallium Oxide Films by Metalorganic Vapor Phase Epitaxy
- Production Efficiency Improved by 2X Compared to Conventional Systems: Announcement of the Release of the UR26K-CCD for Mass Production GaN MOCVD Systems
- Notice Regarding the Sales of BRUTE®-Hydrazine, an Anhydrous Hydrazine Material
- Taiyo Nippon Sanso Gallium Oxide MOCVD System Installed and Qualified for Operation at Tokyo University of Agriculture and Technology
- Taiyo Nippon Sanso and RIKEN demonstrate MOCVD AlGaN-based deep ultraviolet LED EL emission at 226nm
- Taiyo Nippon Sanso and North Carolina State University Agree to Three-Year Collaboration
- Sandia National Laboratories Selects Second MOCVD Platform
- TNSC Announces Strategic Alliance with 3D Printing Corporation K.K.
- Successful metalorganic vapor phase epitaxy of β-gallium oxide crystals
- Taiyo Nippon Sanso MOCVD equipment division receiving Industry Award
- Opening of Additive Manufacturing Advanced Room
- MCHC Now Newsletter
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