AIST and Taiyo Nippon Sanso will present on “Overview of hydride vapor phase epitaxy development for affordable III-V solar cells at AIST,” Ryuji Oshima, Yasushi Shoji, Kikuo Makita, Akinori Ubukata, Shuuichi Koseki, Takeyoshi Sugaya, at the 23rd American Conference on Crystal Growth and Epitaxy (ACCGE-23) and 21st US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-21) to be held in Tucson, Arizona, USA, August 13-18, 2023
Taiyo Nippon Sanso and Rasirc will be presenting on “Silicon Nitride ALD Process Using High Purity Hydrazine for Low Temperature Deposition,” at the 23rd International Conference on Atomic Layer Deposition (ALD) in Bellevue, Washington from July 23rd to 26th
Production Efficiency Improved by 2X Compared to Conventional Systems: Announcement of the Release of the UR26K-CCD for Mass Production GaN MOCVD Systems
